Track-etched nanopores in spin-coated polycarbonate films applied as sputtering mask
Résumé
Thin polycarbonate films were spin-coated on silicon substrates and subsequently irradiated with 1-GeV U ions. The ion tracks in the polymer layer were chemically etched yielding nanopores of about 40 nm diameter. In a second process, the nanoporous polymer film acted as mask for structuring the Si substrate underneath. Sputtering with 5-keV Xe ions produced surface craters of depth ~150 nm and diameter ~70 nm. This arrangement can be used for the fabrication of track-based nanostructures with self-aligned apertures.
Fichier principal
PB22-revised-Manuscript_Nix.pdf (474.44 Ko)
Télécharger le fichier
shim2008.pdf (11.98 Ko)
Télécharger le fichier
| Format | Autre |
|---|